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Copper’s resistivity depends on its crystal structure, void volume, grain boundaries and material interface mismatch, which becomes more significant at smaller scales. The formation of copper (Cu) ...

Trends in advanced device fabrication require combined lithography-etching multi-patterning sequences and self-aligned multi-patterning to form devices’ finest features at subwavelength dimensions. As ...

The process comprises a surface nitrogenation step via N + ion bombardment, followed by O 2 plasma treatment to form volatile etching byproducts. This approach enables subatomic-level etching ...

WHAT I believe to be a novel and useful reagent for the etching of steel specimens for microscopic examination has recently been worked out in this laboratory by the writer, in conjunction with Mr. J.

TOKYO--(BUSINESS WIRE)--NIPPON KINZOKU CO., LTD. (Headquarters: Minato-ku, Tokyo) is pleased to announce the launch of its fourth environmentally-friendly “Eco-Product” series, STA (Special Tension ...

CRC Etch-10 is a high-performance red oxide vinyl etch primer, designed to deliver outstanding adhesion and corrosion ...