Scientists in Germany have developed a new process for deposition of silicon dioxide layers during cell production. Without the need for high pressure, flammable gases, or vacuum conditions, the ...

Chemical vapour deposition (CVD) is a pivotal technique for fabricating thin films and nanostructured materials. This versatile process facilitates the controlled conversion of precursor gases into ...

The term "ALD" was first used around 2000. This technique achieves atomic layer control and conformal deposition through successive, self-limiting surface reactions. It involves introducing chemical ...